Plasma-enhanced CVD

    J.J.M. Sanders (Manager)

Facility/equipment: Equipment

    Description

    The generation of a plasma, i.e. through the application of a DC or RF electric field to a gap between two metal electrodes and containing the deposition precursor gases, allows the decomposition/dissociation of the molecules into depositing radicals by means of electron impact reactions. The high reactivity achieved in the plasma phase allows for low substrate temperatures, compatible with processing of thermally sensitive substrates (e.g. polymers). At PMP we investigate deposition processes in direct plasma configurations (parallel plate RF capacitively coupled plasma), remote configurations (inductively RF coupled plasma) and operating at atmospheric pressure (roll-to-roll atmospheric pressure glow discharge).

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    vapor deposition
    atmospheric pressure
    configurations
    parallel plates
    glow discharges
    electron impact
    reactivity
    direct current
    dissociation
    decomposition
    electrodes
    electric fields
    polymers
    gases
    metals
    molecules
    temperature