Plasma-enhanced CVD

    J.J.M. Sanders (Manager)

Facility/equipment: Equipment

    Equipments Details

    Description

    The generation of a plasma, i.e. through the application of a DC or RF electric field to a gap between two metal electrodes and containing the deposition precursor gases, allows the decomposition/dissociation of the molecules into depositing radicals by means of electron impact reactions. The high reactivity achieved in the plasma phase allows for low substrate temperatures, compatible with processing of thermally sensitive substrates (e.g. polymers). At PMP we investigate deposition processes in direct plasma configurations (parallel plate RF capacitively coupled plasma), remote configurations (inductively RF coupled plasma) and operating at atmospheric pressure (roll-to-roll atmospheric pressure glow discharge).

    Fingerprint Explore the research areas in which this equipment has been used. These labels are generated based on the related outputs. Together they form a unique fingerprint.