Oxford Oxide/Nitride PECVD

  • Tjibbe de Vries (Manager)

Facility/equipment: Equipment

    Equipments Details

    Description

    Parallel plate reactor. Deposition of nitride and oxide. Deposition of etching mask layers.

    Fingerprint

    Explore the research areas in which this equipment has been used. These labels are generated based on the related outputs. Together they form a unique fingerprint.