Oxford Oxide/Nitride PECVD

  • Tjibbe de Vries (Manager)
NanoLab@TU/e

Facility/equipment: Equipment

    Details

    Description

    Parallel plate reactor. Deposition of nitride and oxide. Deposition of etching mask layers.

    Contact information

    Equipment hierarchy

    NanoLab@TU/e
    Oxford Oxide/Nitride PECVD

    Terms of loan/booking

    Equipment: available for loan/booking - internal and external

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