Oxford Oxide/Nitride PECVD

  • Tjibbe de Vries (Manager)

Facility/equipment: Equipment

    Equipments Details

    Description

    Parallel plate reactor. Deposition of nitride and oxide. Deposition of etching mask layers.
    Photo associated with equipment - csm_sized_PECVD_oxide_nitride_1D057287_2c915c39d2.jpg

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