Oxford Oxide/Nitride ICP PECVD

  • Tjibbe de Vries (Manager)

Facility/equipment: Equipment

    Equipments Details


    PE-CVD reactor in which the plasma is generated by an ICP-source. The system is equipped with a loadlock.
    Photo associated with equipment - sized_ICP_PECVD_oxide_nitride_1D101306.JPG


    Explore the research areas in which this equipment has been used. These labels are generated based on the related outputs. Together they form a unique fingerprint.