Oxford Oxide/Nitride ICP PECVD

  • Tjibbe de Vries (Manager)

Facility/equipment: Equipment

    Equipments Details

    Description

    PE-CVD reactor in which the plasma is generated by an ICP-source. The system is equipped with a loadlock.
    Photo associated with equipment - sized_ICP_PECVD_oxide_nitride_1D101306.JPG

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