Oxford Nitride RIE

  • Stacey Martina (Manager)

Facility/equipment: Equipment

    Equipments Details


    Reactive Ion Etching reactor for etching Dielectric Materials like: Si-Nitride and Si-Oxide using timed etch steps without endpoint detection.


    Explore the research areas in which this equipment has been used. These labels are generated based on the related outputs. Together they form a unique fingerprint.