Oxford Nitride RIE

  • Stacey Martina (Manager)

Facility/equipment: Equipment

    Equipments Details


    Reactive Ion Etching reactor for etching Dielectric Materials like: Si-Nitride and Si-Oxide using timed etch steps without endpoint detection.
    Photo associated with equipment - csm_sized_RIE_nitride_1D057288_d1dbe806bd.jpg


    Explore the research areas in which this equipment has been used. These labels are generated based on the related outputs. Together they form a unique fingerprint.