Oxford Nitride RIE

  • Stacey Martina (Manager)

Facility/equipment: Equipment

    Equipments Details

    Description

    Reactive Ion Etching reactor for etching Dielectric Materials like: Si-Nitride and Si-Oxide using timed etch steps without endpoint detection.
    Photo associated with equipment - csm_sized_RIE_nitride_1D057288_d1dbe806bd.jpg

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