Oxford Instruments OpAL

  • Barathi Krishnamoorthy (Manager)

Facility/equipment: Equipment

    Equipments Details

    Description

    Atomic layer deposition (ALD) reactor, both plasma assisted and thermal. Open load system equipped three precursors-inputs plus a separate H2O precursor input.
    Photo associated with equipment - csm_sized_ALD_OpAL_1D057293_911c958f3a.jpg

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