Oxford Instruments OpAL

    Barathi Krishnamoorthy (Manager)
NanoLab@TU/e

Facility/equipment: Equipment

    Equipments Details

    Description

    Atomic layer deposition (ALD) reactor, both plasma assisted and thermal. Open load system equipped three precursors-inputs plus a separate H2O precursor input.
    Photo associated with equipment

    Contact information

    Name

    Equipment hierarchy

    NanoLab@TU/e
    Oxford Instruments OpAL

    Terms of loan/booking

    Equipment: available for loan/booking - internal and external

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