Oxford Instruments OpAL

    Barathi Krishnamoorthy (Manager)

Facility/equipment: Equipment

    Equipments Details


    Atomic layer deposition (ALD) reactor, both plasma assisted and thermal. Open load system equipped three precursors-inputs plus a separate H2O precursor input.
    Photo associated with equipment


    Explore the research areas in which this equipment has been used. These labels are generated based on the related outputs. Together they form a unique fingerprint.