Oxford Instruments FlexAL 1

    J.J.M. Sanders (Manager)

Facility/equipment: Equipment

    Description

    Atomic layer deposition (ALD) reactor, both plasma assisted and thermal for up to 200 mm wafers. Equipped with a loadlock and four precursors-inputs. Automatic pressure control and turbo pump. Ozone generator and process monitoring available with in-situ spectroscopic ellipsometry, mass spectroscopy and optical emission spectroscopy during process. Has been used for instance for ALD of TiN, Ru, TiO2 and SrTiO3.

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    atomic layer epitaxy
    optical emission spectroscopy
    ozone
    ellipsometry
    mass spectroscopy
    generators
    reactors
    wafers
    pumps