Content available in repository
Content available in repository
Details
Description
Contact-free measuring machine for aspherical and freeform optics in optical systems. The measuring machine consists of three subsystems: the motion system, the contact-free scanning probe and a measuring loop. A special contact-free scanning probe developed within the project scans the surface. This contact-free scanning probe has a range of 5 millimeters and nanometer accuracy. To prevent a long measuring loop and corresponding measurement errors, a special metrology frame is added and the position of the scanning probe relative to that frame is measured interferometrically. The motion guidance consists of air bearings and is adjusted by linear motors using a Dspace system.
Details
| Name | Nanomefos |
|---|---|
| Manufacturers | Equipment & Prototype Center |
×
![]()
Fingerprint
Explore the research areas in which this equipment has been used. These labels are generated based on the related outputs. Together they form a unique fingerprint.
Research output
-
Development and performance demonstration of the NANOMEFOS non-contact measurement machine for freeform optics
Henselmans, R., Cacace, L. A., Kramer, G. F. I., Rosielle, P. C. J. N. & Steinbuch, M., 2009, Proceedings of the 9th Euspen International Conference and 11th Annual General Meeting, 2-5 June 2009, San Sebastian, Spain. Spain, San Sebastian, p. 164-168Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review
Open AccessFile208 Downloads (Pure) -
Freeform optics measurements with the NANOMEFOS non-contact measurement machine
Henselmans, R., Cacace, L. A., Kramer, G. F. I., Rosielle, P. C. J. N. & Steinbuch, M., 2009, Proceedings of the SPIE Optifab 2009, 11-14 May 2009, Rochester, NY, USA. United States, Rochester, NYResearch output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review
Open AccessFile316 Downloads (Pure) -
Nanometer level freeform surface measurements with the NANOMEFOS non-contact measurement machine
Henselmans, R., Cacace, L. A., Kramer, G. F. I., Rosielle, P. C. J. N. & Steinbuch, M., 2009, Optical Manufacturing and Testing VIII, 4–5 August 2009, San Diego, CA, USA. Burge, J. H., Fähnle, O. W. & Williamson, R. (eds.). SPIE, p. 742606-1/11 (Proceedings of SPIE; vol. 7426).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review
7 Citations (Scopus)1 Downloads (Pure)