MBE Createc II/IV/VI

  • P.J. (RenĂ©) van Veldhoven (Manager)

Facility/equipment: Facility

    Details

    Description

    Molecular Beam Epitaxy (MBE) reactor to grow epitaxial layers, Nano-wires for II/IV/VI materials with Closed UHV system with load lock in Glovebox

    Fingerprint

    Explore the research areas in which this equipment has been used. These labels are generated based on the related outputs. Together they form a unique fingerprint.