ETP Reactors

    J.J.M. Sanders (Manager)

Facility/equipment: Equipment

    Description

    2 expanding thermal plasma (ETP) reactors, both equipped with a load-lock chamber. Deposition of amorphous and microcrystalline silicon, silicon nanocrystals, silicon nitride and silicon dioxide, amorphous carbon and aluminium-doped zinc oxide. The setup can be complemented with an rf power supply or pulse-shaped substrate biasing in order to carry out dedicated studies on the role of ion bombardment on film growth. Furthermore, the setups are equipped with in situ diagnostics such as optical emission spectroscopy, spectroscopic ellipsometry and mass spectrometry.

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    thermal plasmas
    reactors
    optical emission spectroscopy
    silicon
    dioxides
    silicon nitrides
    power supplies
    zinc oxides
    ellipsometry
    amorphous silicon
    bombardment
    nanocrystals
    mass spectroscopy
    chambers
    silicon dioxide
    aluminum
    carbon
    pulses
    spectroscopy
    ions