Content available in repository
Content available in repository
Description
Full supplementary material for manuscript.
| Date made available | 2024 |
|---|---|
| Publisher | AIP Publishing |
Research output
- 1 Article
-
Atomic layer deposition of transition metal chalcogenide TaSx using Ta[N(CH3)2]3[NC(CH3)3] precursor and H2S plasma
Deijkers, J. H., Thepass, H., Verheijen, M. A., Sprey, H., Maes, J. W., Kessels, W. M. M. & Mackus, A. J. M. (Corresponding author), Dec 2024, In: Journal of Vacuum Science and Technology A. 42, 6, 7 p., 062404.Research output: Contribution to journal › Article › Academic › peer-review
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