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Isotropic plasma atomic layer etching of Al2O3

  • Nicholas J. Chittock (Creator)

Dataset

Description

Data used to plot all of the figures in the letter titled "Isotropic plasma atomic layer etching of Al2O3 using a fluorine containing plasma and Al(CH3)3)". Each figure has its own page, original origin files are available upon request.
Date made available21 Oct 2020
Publisher4TU.Centre for Research Data

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