US Patent Issued to Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO on Dec. 8 for "Method of and system for determining an overlay or alignment error between a first and a second device layer of a multilayer semiconductor devic

Press/Media: Expert Comment

Period9 Dec 2020

Media coverage

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Media coverage

  • TitleUS Patent Issued to Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO on Dec. 8 for "Method of and system for determining an overlay or alignment error between a first and a second device layer of a multilayer semiconductor devic
    Media name/outletUS Fed News
    CountryUnited States
    Date9/12/20
    PersonsHamed Sadeghian Marnani