US Patent Issued to ASML NETHERLANDS on Jan. 19 for "Substrate holder, a lithographic apparatus and method of manufacturing devices" (Dutch Inventors)

  • Güneş Nakiboǧlu

Press/Media: Expert Comment

Period19 Jan 2021

Media coverage

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Media coverage

  • TitleUS Patent Issued to ASML NETHERLANDS on Jan. 19 for "Substrate holder, a lithographic apparatus and method of manufacturing devices" (Dutch Inventors)
    Media name/outletUS Fed News
    Country/TerritoryUnited States
    Date19/01/21
    PersonsGüneş Nakiboǧlu
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