US Patent Issued to ASML NETHERLANDS on Jan. 10 for "Lithographic apparatus and device manufacturing method involving a sensor detecting a radiation beam through liquid" (Dutch Inventors)

Press/Media: Expert Comment

Period10 Jan 2017

Media coverage

1

Media coverage

  • TitleUS Patent Issued to ASML NETHERLANDS on Jan. 10 for "Lithographic apparatus and device manufacturing method involving a sensor detecting a radiation beam through liquid" (Dutch Inventors)
    Media name/outletUS Fed News
    Country/TerritoryUnited States
    Date10/01/17
    PersonsHans Butler
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