US Patent Issued to ASML Netherlands on Aug. 4 for "Projection system and mirror and radiation source for a lithographic apparatus" (Dutch Inventors)

Press/Media: Expert Comment

Period4 Aug 2020

Media coverage

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Media coverage

  • TitleUS Patent Issued to ASML Netherlands on Aug. 4 for "Projection system and mirror and radiation source for a lithographic apparatus" (Dutch Inventors)
    Media name/outletUS Fed News
    CountryUnited States
    Date4/08/20
    PersonsHans Butler
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