Shenzhen Advanced Tech Research Institute of Chinese Academy of Sciences and Shenzhen Advanced Electronic Material International Innovation Res Institute Seeks Patent for Surface Modification Method and Application of Silicon Dioxide

Media coverage

• Title	Shenzhen Advanced Tech Research Institute of Chinese Academy of Sciences and Shenzhen Advanced Electronic Material International Innovation Res Institute Seeks Patent for Surface Modification Method and Application of Silicon Dioxide
  Media name/outlet	Global IP News. Semiconductor Patent News
  Country/Territory	India
  Date	1/12/22
  URL	ct.moreover.com/?a=49404334973&p=1gw&v=1&x=bGt2JMLdra8-qD_YZrsTOA
  Persons	Yang Liu