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• Using Hawkeye from the Avengers to Communicate on the Eye

  B. Fitzgerald

  20/01/18

  1 item of Media coverage

  Press/Media: Expert Comment

• Using Machine Learning Methods to Predict Response to Immunotherapy

  Federica Eduati

  1/07/21

  1 item of Media coverage

  Press/Media: Expert Comment

• Using Machine Learning Methods to Predict Response to Immunotherapy AI & Surroundings

  Federica Eduati

  1/07/21

  1 item of Media coverage

  Press/Media: Expert Comment

• Using plasma technology to feed the world

  Fausto Gallucci

  18/02/21

  1 item of Media coverage

  Press/Media: Expert Comment

• Using plasma technology to feed world

  Sirui Li & Fausto Gallucci

  18/02/21

  1 item of Media coverage

  Press/Media: Expert Comment

• Using Sr[Mg3SiN4]Eu2+ phosphor for enhancing color uniformity and luminous efficacy of the 7000 K IPP-WLEDs

  Phuong H. Nguyen

  21/03/20

  1 item of Media coverage

  Press/Media: Expert Comment

• Using superheroes such as Hawkeye, Wonder Woman and the Invisible Woman in the physics classroom

  B. Fitzgerald

  9/04/18

  1 item of Media coverage

  Press/Media: Expert Comment

• USING SUPERHEROES SUCH AS HAWKEYE, WONDER WOMAN AND THE INVISIBLE WOMAN IN THE PHYSICS CLASSROOM

  B. Fitzgerald

  9/04/18

  1 item of Media coverage

  Press/Media: Expert Comment

• Using the Application Builder as a tool for teaching students

  A.W.M. (Jos) van Schijndel

  19/05/16

  1 item of Media coverage

  Press/Media: Research

• US Patent Issued to Academy of Shenzhen Guohua Optoelectronics, Shenzhen Guohua Optoelectronics on April 27 for "Bistable driving method for electrowetting display and related electrowetting display" (Chinese Inventors)

  Guofu Zhou

  27/04/21

  1 item of Media coverage

  Press/Media: Expert Comment

• US Patent Issued to ASML Netherlands on April 12 for "Electron beam inspection apparatus stage positioning" (Dutch, American Inventors)

  Hans Butler

  13/04/22

  1 item of Media coverage

  Press/Media: Expert Comment

• US Patent Issued to ASML Netherlands on April 13 for "Lithographic apparatus" (Dutch Inventors)

  Hans Butler

  13/04/21

  1 item of Media coverage

  Press/Media: Expert Comment

• US Patent Issued to ASML Netherlands on Aug. 4 for "Projection system and mirror and radiation source for a lithographic apparatus" (Dutch Inventors)

  Hans Butler

  4/08/20

  1 item of Media coverage

  Press/Media: Expert Comment

• US Patent Issued to ASML Netherlands on Dec. 10 for "Lithographic apparatus and device manufacturing method" (Dutch Inventors)

  Hans Butler

  10/12/19

  1 item of Media coverage

  Press/Media: Expert Comment

• US Patent Issued to ASML NETHERLANDS on Dec. 10 for "Lithographic apparatus and device manufacturing method" (Dutch Inventors)

  Hans Butler

  11/12/19

  1 item of Media coverage

  Press/Media: Expert Comment

• US Patent Issued to ASML Netherlands on Dec. 15 for "Lithographic apparatus and device manufacturing method" (Dutch Inventors)

  Hans Butler

  16/12/20

  1 item of Media coverage

  Press/Media: Expert Comment

• US Patent Issued to ASML Netherlands on Feb. 16 for "Support structure, method and lithographic apparatus" (Dutch Inventor)

  Hans Butler

  17/02/21

  1 item of Media coverage

  Press/Media: Expert Comment

• US Patent Issued to ASML Netherlands on Feb. 25 for "Lithographic apparatus" (Dutch Inventors)

  Hans Butler

  26/02/20

  1 item of Media coverage

  Press/Media: Expert Comment

• US Patent Issued to ASML Netherlands on Feb. 4 for "Lithography apparatus and device manufacturing method" (Dutch Inventors)

  Hans Butler

  4/02/20

  1 item of Media coverage

  Press/Media: Expert Comment

• US Patent Issued to ASML NETHERLANDS on Jan. 10 for "Lithographic apparatus and device manufacturing method involving a sensor detecting a radiation beam through liquid" (Dutch Inventors)

  H. Butler

  10/01/17

  1 item of Media coverage

  Press/Media: Expert Comment

• US Patent Issued to ASML NETHERLANDS on July 25 for "Imprint lithographic apparatus and imprint lithographic method" (Dutch Inventors)

  H. Butler

  26/07/17

  1 item of Media coverage

  Press/Media: Expert Comment

• US Patent Issued to ASML NETHERLANDS on June 28 for "Lithographic apparatus with actuator to compensate acoustic vibration" (Dutch, Belgian Inventors)

  H. Butler

  28/06/16

  1 item of Media coverage

  Press/Media: Expert Comment

• US Patent Issued to ASML Netherlands on June 8 for "Bearing device, magnetic gravity compensator, vibration isolation system, lithographic apparatus, and method to control a gravity compensator having a negative stiffness" (Dutch Inventors)

  Hans Butler

  9/06/21

  1 item of Media coverage

  Press/Media: Expert Comment

• US Patent Issued to ASML Netherlands on June 9 for "Lithographic apparatus and device manufacturing method" (Dutch Inventors)

  Hans Butler

  10/06/20

  1 item of Media coverage

  Press/Media: Expert Comment

• US Patent Issued to ASML Netherlands on March 1 for "Metrology apparatus" (Dutch Inventors)

  Hans Butler

  1/03/22

  1 item of Media coverage

  Press/Media: Expert Comment