5th International Conference on Hot-Wire Chemical Vapor Deposition (HWCVD 5), August 20-24, 2008, Cambridge, MA, USA

Activity: Talk or presentation types › Invited talk › Scientific

Description

Silicon surface passivation by hot-wire CVD Si thin films studied in situ surface spectroscopy
Period1 Aug 2008
Event title5th International Conference on Hot-Wire Chemical Vapor Deposition (HWCVD 2008)
Event typeConference
Conference number5
LocationCambridge, United States, Massachusetts

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